UV Irradiation Effects on Chemical Vapor Deposition of SiO...

Japanese Journal of Applied Physics 1985 / 3 Vol. 24; Iss. Part 1, No

UV Irradiation Effects on Chemical Vapor Deposition of SiO 2

Takahashi, Jun-ichi, Tabe, Michiharu
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.24.274
Date:
March, 1985
File:
PDF, 747 KB
1985
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