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The effect of deposition temperature on the properties of TiN diffusion barriers prepared by atomic layer chemical vapor deposition
Hsyi-En Cheng, Wen-Jen Lee, C.-M. HsuVolume:
485
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2005.03.049
File:
PDF, 557 KB
english, 2005