Microstructural defect characterisation of a-Si:H deposited...

Thin Solid Films 2006 Vol. 501; Iss. 1-2

Microstructural defect characterisation of a-Si:H deposited by low temperature HW-CVD on paper substrates

D.T. Britton, M. Härting, D. Knoesen, Z. Sigcau, F.P. Nemalili, T.P. Ntsoane, P. Sperr, W. Egger, M. Nippus
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Volume:
501
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.07.111
File:
PDF, 300 KB
english, 2006
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