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Characterization and thermal stability of fluorosilicate glass films deposited by high density plasma chemical vapor deposition with different bias power
Wen-Chu Hsiao, Chuan-Pu Liu, Ying Lang Wang, Yi-Lung ChengVolume:
498
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.07.129
File:
PDF, 193 KB
english, 2006