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Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering
M. Benegra, D.G. Lamas, M.E. Fernández de Rapp, N. Mingolo, A.O. Kunrath, R.M. SouzaVolume:
494
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.08.214
File:
PDF, 219 KB
english, 2006