Current-induced metal–insulator transition in VOx thin film...

Thin Solid Films 2006 Vol. 495; Iss. 1-2

Current-induced metal–insulator transition in VOx thin film prepared by rapid-thermal-annealing

Choong-Rae Cho, SungIl Cho, Sidorkin Vadim, Ranju Jung, Inkyeong Yoo
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Volume:
495
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.08.241
File:
PDF, 264 KB
english, 2006
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