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Characterization of chemically amplified resist for X-ray lithography by Fourier transform infrared spectroscopy
T.L. Tan, D. Wong, P. Lee, R.S. Rawat, S. Springham, A. PatranVolume:
504
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.09.151
File:
PDF, 224 KB
english, 2006