Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
E.B. Liao, W.H. Teh, K.W. Teoh, A.A.O. Tay, H.H. Feng, R. KumarVolume:
504
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.09.159
File:
PDF, 494 KB
english, 2006