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Infrared Characterization of Interface State Reduction by F 2 Treatment in SiO 2 /Si Structure using Photo-CVD SiO 2 Film
Nakamura, Masakazu, Okuyama, Masanori, Hamakawa, YoshihiroVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L687
Date:
May, 1990
File:
PDF, 531 KB
1990