Temperature effect and stress on microcrystalline silicon thin films deposited under high pressure plasma conditions
E. Amanatides, E. Katsia, D. Mataras, A. Soto, G.A. VoyiatzisVolume:
511-512
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2005.12.121
File:
PDF, 137 KB
english, 2006