Optimized measurement of strained Si thickness and SiGe virtual substrate composition by spectroscopic ellipsometry
C.J. Vineis, M. Erdtmann, C.W. LeitzVolume:
513
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2006.01.023
File:
PDF, 168 KB
english, 2006