The influence of the edge effect of the mask on the strain...

Thin Solid Films 2006 Vol. 514; Iss. 1-2

The influence of the edge effect of the mask on the strain and the morphology of SiGe film grown at the patterned Si substrate by molecular beam epitaxy

Hongbin Yang, Xiang-jiu Zhang, Zuiming Jiang, Xiangdang Lu, Lihui Bai, Xinju Yang, Yongliang Fan, Dongzhi Hu, Yanqing Sun, Weining Huang
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Volume:
514
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2006.02.037
File:
PDF, 333 KB
english, 2006
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