Photoresist etching using Ar/O2 and He/O2 atmospheric...

Thin Solid Films 2006 Vol. 515; Iss. 4

Photoresist etching using Ar/O2 and He/O2 atmospheric pressure plasma

Mi-Hee Jung, Ho-Suk Choi
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Volume:
515
Year:
2006
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2006.03.030
File:
PDF, 939 KB
english, 2006
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