Influence of chemical etching on step bunching formation on GaAs (100) during thermal oxide removal
A. Guillén-Cervantes, Z. Rivera-Alvarez, M. López-López, A. Escobosa, V.M. Sánchez-ReséndizVolume:
515
Year:
2007
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2006.10.004
File:
PDF, 919 KB
english, 2007