Initial reaction of HfO2 atomic layer deposition on silicon...

Thin Solid Films 2007 Vol. 515; Iss. 11

Initial reaction of HfO2 atomic layer deposition on silicon surfaces with different oxygen levels: A density functional theory study

Jie Ren, Feng-Yi Liu, Ya-Tong Zhang, David Wei Zhang
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
515
Year:
2007
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2006.11.045
File:
PDF, 759 KB
english, 2007
Conversion to is in progress
Conversion to is failed