Influence of TiO2 incorporation in HfO2 and Al2O3 based capacitor dielectrics
Kaupo Kukli, Mikko Ritala, Markku Leskelä, Jonas Sundqvist, Lars Oberbeck, Johannes Heitmann, Uwe Schröder, Jaan Aarik, Aleks AidlaVolume:
515
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2006.11.049
File:
PDF, 1.03 MB
english, 2007