Growth of Ge nanoparticles on SiO2/Si interfaces during annealing of plasma enhanced chemical vapor deposited thin films
S. Foss, T.G. Finstad, A. Dana, A. AydinliVolume:
515
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2006.11.094
File:
PDF, 485 KB
english, 2007