The effect of argon dilution on deposition of...

The effect of argon dilution on deposition of microcrystalline silicon by microwave plasma enhanced chemical vapor deposition

W.J. Soppe, C. Devilee, M. Geusebroek, J. Löffler, H.-J. Muffler
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Volume:
515
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2006.11.156
File:
PDF, 537 KB
english, 2007
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