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The effect of argon dilution on deposition of microcrystalline silicon by microwave plasma enhanced chemical vapor deposition
W.J. Soppe, C. Devilee, M. Geusebroek, J. Löffler, H.-J. MufflerVolume:
515
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2006.11.156
File:
PDF, 537 KB
english, 2007