Oxide bound impact on hot-carrier degradation for gate...

Oxide bound impact on hot-carrier degradation for gate electrode workfunction engineered (GEWE) silicon nanowire MOSFET

Gupta, Neha, Kumar, Ajay, Chaujar, Rishu
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Volume:
22
Language:
english
Journal:
Microsystem Technologies
DOI:
10.1007/s00542-015-2557-9
Date:
November, 2016
File:
PDF, 1.54 MB
english, 2016
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