XPS Sputter Depth Profiling Applid to the Analysis of Si/SiO2, Si/SiOxNy and Si/Si3N4
Benkherourou, O., Deville, J.P.Volume:
19-20
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.19-20.593
Date:
January, 1991
File:
PDF, 370 KB
1991