Improved stability of intrinsic nanocrystalline Si thin films deposited by hot-wire chemical vapour deposition technique
S. Halindintwali, D. Knoesen, R. Swanepoel, B.A. Julies, C. Arendse, T. Muller, C.C. Theron, A. Gordijn, P.C.P. Bronsveld, J.K. Rath, R.E.I. SchroppVolume:
515
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2007.03.051
File:
PDF, 364 KB
english, 2007