Improved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution process
Chisato Niikura, Romain Brenot, Joelle Guillet, Jean-Eric BouréeVolume:
516
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2007.06.049
File:
PDF, 310 KB
english, 2008