Microstructure and electrical properties of Cu films obtained by chemical vapor deposition of copper(I) pentafluoropropionate complexes with vinyltrialkylsilanes
P. Piszczek, I. Szymańska, W. Bała, K. Bartkiewicz, E. Talik, J. HeimanVolume:
516
Year:
2008
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2007.07.173
File:
PDF, 1.74 MB
english, 2008