Plasma enhanced chemical vapor deposition of a-C:H films in CH4–CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process
G. Gottardi, N. Laidani, R. Bartali, V. Micheli, M. AnderleVolume:
516
Year:
2008
Language:
english
Pages:
9
DOI:
10.1016/j.tsf.2007.07.179
File:
PDF, 868 KB
english, 2008