Performance and quality analysis of Mo–Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography
Kenji Hiruma, Shinji Miyagaki, Hiromasa Yamanashi, Yuusuke Tanaka, Iwao NishiyamaVolume:
516
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2007.07.182
File:
PDF, 1.20 MB
english, 2008