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Deposition of nanocryctalline silicon thin films: Effect of total pressure and substrate temperature
R. Baghdad, D. Benlakehal, X. Portier, K. Zellama, S. Charvet, J.D. Sib, M. Clin, L. ChahedVolume:
516
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2007.07.190
File:
PDF, 954 KB
english, 2008