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Reactive magnetron sputtering of Inconel 690 by Ar–N2 plasma
A. Saker, H. He, T. Czerwiec, X. Li, L. Tran Huu, C. Dong, H. Michel, C. FrantzVolume:
516
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2007.07.212
File:
PDF, 1.47 MB
english, 2008