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Plasma deposition and characterization of silicon oxide-containing diamond-like carbon films obtained from CH4:SiH4:O2 gas mixtures
J.C. Damasceno, S.S. Camargo Jr.Volume:
516
Year:
2008
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2007.10.119
File:
PDF, 281 KB
english, 2008