Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films
X.D. Zhang, F.R. Zhang, E. Amanatides, D. Mataras, Y. ZhaoVolume:
516
Year:
2008
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2007.12.060
File:
PDF, 633 KB
english, 2008