Effect of substrate bias on the plasma enhanced chemical...

Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

X.D. Zhang, F.R. Zhang, E. Amanatides, D. Mataras, Y. Zhao
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Volume:
516
Year:
2008
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2007.12.060
File:
PDF, 633 KB
english, 2008
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