Modeling and experiments of high-pressure VHF SiH4/H2 discharges for higher microcrystalline silicon deposition rate
X.D. Zhang, F.R. Zhang, E. Amanatides, D. Mataras, Y. ZhaoVolume:
516
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2007.12.066
File:
PDF, 568 KB
english, 2008