A soft Plasma Enhanced-Chemical Vapor Deposition process...

Thin Solid Films 2008 Vol. 516; Iss. 21

A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films

Davide Barreca, Alberto Gasparotto, Chiara Maccato, Eugenio Tondello, Gilberto Rossetto
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Volume:
516
Year:
2008
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2008.02.029
File:
PDF, 800 KB
english, 2008
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