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HfSiO/SiO2- and SiO2/HfSiO/SiO2-gate stacks for non-volatile memories
T. Erlbacher, M.P.M. Jank, M. Lemberger, A.J. Bauer, H. RysselVolume:
516
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2008.04.038
File:
PDF, 801 KB
english, 2008