Ion beam sputter deposited TiAlN films for...

Thin Solid Films 2008 Vol. 516; Iss. 21

Ion beam sputter deposited TiAlN films for metal–insulator–metal (Ba,Sr)TiO3 capacitor application

Sheng-Yi Lee, Sheng-Chang Wang, Jen-Sue Chen, Jow-Lay Huang
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Volume:
516
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2008.04.046
File:
PDF, 1.05 MB
english, 2008
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