Application of fluorine doped oxide (SiOF) spacers for...

Thin Solid Films 2008 Vol. 517; Iss. 3

Application of fluorine doped oxide (SiOF) spacers for improving reliability in low temperature polycrystalline thin film transistors

Li-Wei Feng, Ting-Chang Chang, Po-Tsun Liu, Chun-Hao Tu, Yung-Chun Wu, Che-Yu Yang, Chun-Yen Chang
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Volume:
517
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2008.04.106
File:
PDF, 447 KB
english, 2008
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