Microstructural change of dislocation structure around...

Thin Solid Films 2008 Vol. 517; Iss. 1

Microstructural change of dislocation structure around SiGe/Si interface in SGOI wafer with ramping process

Seiichiro Ii, Yuichi Takaki, Ken-ichi Ikeda, Hideharu Nakashima, Hiroshi Nakashima
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
517
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2008.08.011
File:
PDF, 187 KB
english, 2008
Conversion to is in progress
Conversion to is failed