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Ex-situ wet clean and in-situ hydrogen clean for Si and SiGe epitaxy
Thomas Kormann, Philippe Garnier, Guillaume Chabanne, Arnoud FortuinVolume:
517
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2008.08.014
File:
PDF, 365 KB
english, 2008