Very low-temperature epitaxial growth of silicon and germanium using plasma-assisted CVD
Masao Sakuraba, Daisuke Muto, Masaki Mori, Katsutoshi Sugawara, Junichi MurotaVolume:
517
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2008.08.028
File:
PDF, 512 KB
english, 2008