Influence of preparing process on total-dose radiation...

Thin Solid Films 2008 Vol. 517; Iss. 1

Influence of preparing process on total-dose radiation response of high-k Hf-based gate dielectrics

Zhaorui Song, Xinhong Cheng, Enxia Zhang, Yumei Xing, Yuehui Yu, Zhengxuan Zhang, Xi Wang, Dashen Shen
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Volume:
517
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2008.08.065
File:
PDF, 353 KB
english, 2008
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