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Silicide and germanide technology for contacts and gates in MOSFET applications
Shigeaki Zaima, Osamu Nakatsuka, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki OgawaVolume:
517
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2008.08.097
File:
PDF, 380 KB
english, 2008