Characterization of thin TiO2 films prepared by plasma...

Thin Solid Films 2009 Vol. 517; Iss. 18

Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications

A. Sobczyk-Guzenda, M. Gazicki-Lipman, H. Szymanowski, J. Kowalski, P. Wojciechowski, T. Halamus, A. Tracz
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Volume:
517
Year:
2009
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2009.01.010
File:
PDF, 696 KB
english, 2009
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