A study on dry etching for profile and selectivity of ZrO2 thin films over Si by using high density plasma
Jong-Chang Woo, Sang-Gi Kim, Jin-Gun Koo, Gwan-Ha Kim, Dong-Pyo Kim, Chong-Hee Yu, Jin-Yeong Kang, Chang-IL KimVolume:
517
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2009.02.012
File:
PDF, 986 KB
english, 2009