Using hybrid ionized physical vapor deposition to control...

Thin Solid Films 2009 Vol. 517; Iss. 13

Using hybrid ionized physical vapor deposition to control interface reaction during titanium deposition onto aluminum under-layer

Chengyu Niu, Greg Magsamen, Brian Stephenson, Jakisa Radja
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Volume:
517
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.02.025
File:
PDF, 731 KB
english, 2009
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