Analysis of self-heating related instability in n-channel...

Thin Solid Films 2009 Vol. 517; Iss. 23

Analysis of self-heating related instability in n-channel polysilicon thin film transistors fabricated on polyimide

L. Maiolo, M. Cuscunà, L. Mariucci, A. Minotti, A. Pecora, D. Simeone, A. Valletta, G. Fortunato
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Volume:
517
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.02.105
File:
PDF, 388 KB
english, 2009
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