Stability of indium-oxide thin-film transistors by reactive...

Thin Solid Films 2009 Vol. 517; Iss. 23

Stability of indium-oxide thin-film transistors by reactive ion beam assisted deposition

Y. Vygranenko, K. Wang, R. Chaji, M. Vieira, J. Robertson, A. Nathan
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Volume:
517
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.02.108
File:
PDF, 268 KB
english, 2009
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