High thermal stability of AlCrTaTiZr nitride film as...

Thin Solid Films 2009 Vol. 517; Iss. 17

High thermal stability of AlCrTaTiZr nitride film as diffusion barrier for copper metallization

Shou-Yi Chang, Ming-Ku Chen
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Volume:
517
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2009.03.078
File:
PDF, 622 KB
english, 2009
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