![](/img/cover-not-exists.png)
Effects of different nitrogen/methane ratios on the residual stress of a-C:N thin films prepared by plasma enhanced chemical vapor deposition
Rong-Shian Chu, Sham-Tsong ShiueVolume:
517
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.03.085
File:
PDF, 362 KB
english, 2009