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Plasma etching of virtually stress-free stacked silicon nitride films
M. Mikolajūnas, J. Baltrušaitis, V. Kopustinskas, G. Vanagas, V. Grigaliūnas, D. ViržonisVolume:
517
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.03.183
File:
PDF, 311 KB
english, 2009