Effects of process parameters on the LaNiO3 thin films...

Thin Solid Films 2009 Vol. 517; Iss. 24

Effects of process parameters on the LaNiO3 thin films deposited by radio-frequency magnetron sputtering

Congchun Zhang, Jie Hou, Rui Rao, Chunsheng Yang, Guifu Ding
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Volume:
517
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.05.035
File:
PDF, 362 KB
english, 2009
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