Effect of the substrate temperature on zirconium oxynitride thin films deposited by water vapour–nitrogen radiofrequency magnetron sputtering
M.A. Signore, A. Rizzo, L. Tapfer, E. Piscopiello, L. Capodieci, A. CappelloVolume:
518
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.07.153
File:
PDF, 359 KB
english, 2010