Plasma-enhanced chemical vapor deposition of carbon films...

Thin Solid Films 2009 Vol. 518; Iss. 3

Plasma-enhanced chemical vapor deposition of carbon films using dibromoadamantane

Tatsuru Shirafuji, Yoshiyasu Nishimura, Kunihide Tachibana, Hirotoshi Ishii
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Volume:
518
Year:
2009
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2009.07.170
File:
PDF, 724 KB
english, 2009
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